Deposition of AlN on Nimonic 75 by PFD device

Abstract

In this study, thin films of aluminium nitride (AlN) are deposited on Nimonic 75 substrates using a 4 kJ Mather type plasma focus device (PFD) for 5, 10 and 15 focus shots. For the deposition of AlN films, a solid aluminium fitted anode was used instead of a copper anode. The PFD was operated with nitrogen gas at a pressure of 2 torr. X-ray diffraction results reveal the formation of a nanocrystalline AlN coating on the surface of the substrate. The crystallite size is dependent on the number of focus shots. The density of grains increased with an increase in the number of focus deposition shots, as illustrated by field emission scanning electron microscopy (FESEM). The FESEM images confirm the distribution of spherical grains for 15 focus shots. Energy dispersive X-ray spectroscopy spectra indicate the presence of expected constituent elements such as N and Al.