Abstract
ABSTRACTHigh quality well-adhered microcrystalline diamond coatings have been produced by the microwave plasma enhanced chemical vapor deposition (MPECVD) technique on cemented carbide substrates. A multi-interlayer system Cr/CrN/Cr was deposited on the WC-Co substrate before diamond deposition to work as a diffusion barrier. The coated substrate was peened with friable diamond powder to roughen the surface resulting in high nucleation density. Adherent diamond film has been successfully deposited on the substrate at temperature around 700°C with 1.0 % CH4 in Hydrogen plasma. The surface morphology and film structure has been studied by Scanning Electron Microscopy (SEM) and X-Ray diffraction technique. The adhesion of the diamond film has been evaluated by Rockwell indentation tests.
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