Abstract
A multielectrode CVD system having a region of crossed magnetic and electric fields is used for the deposition of a-C:H films in a dc glow-discharge plasma. The I-V characteristics of the discharge are taken in the pressure range from 0.004 to 0.1 Pa. The effect of magnetic field on the I-V characteristics is investigated. The film deposition rate as a function of discharge power, hydrocarbon vapor pressure, conductivity and potential of the substrate, and inert gas is studied. The results obtained are discussed in terms of the adsorption mechanism of film condensation in a plasma. The effect of deposition rate on the film properties is analyzed.
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