Deposition behavior in a low-temperature cascade arc torch (CAT) polymerization process

Abstract

Two kinds of hydrocarbon type monomers and three kinds of organosilicons were polymerized by a low-temperature cascade arc argon plasma torch. Their deposition behaviors were studied as a function of experimental parameters and monomer elemental compositions. It was found that the normalized deposition rate (DR), expressed as deposition yield of DR/(FM)m, was determined by a composite operational parameter, W*(FM)c/(FM)m, where W is the power input, and (FM)c and (FM)m are the mass flow rates of carrier gases and monomers, respectively. Experimental results indicated that the deposition yield is highly dependent on the elementary compositions of monomers. Optical emission spectroscopy study on the argon plasma torch showed that the emission intensity of excited argon neutrals was proportional to the value of the parameter W*(FM)c. These results further certified that excited argon neutrals are the main energy carriers from the cascade arc column to activate monomers in the argon plasma torch. © 1999 John Wiley & Sons, Inc. J Polym Sci A: Polym Chem 37: 967–982, 1999