Abstract
a-C:H films were deposited on polymethyl methacrylate (PMMA) using electron cyclotron resonance (ECR) microwave plasma (MP) decomposition of CH 4 diluted in Ar gas. The effect of substrate on the deposition process, optical properties and structure of the a-C:H films was studied. A transparent polymer-like carbon film formed on PMMA, while a semi-transparent diamond-like carbon (DLC) formed on silicon under the same growth conditions. The a-C:H films grown under certain conditions were found to substantially improve the wear resistance of PMMA substrates.
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