Abstract
ABSTRACTThe importance of micro-crystalline silicon (μc-Si:H) for the photo-conducting dipole antenna application is investigated in this paper. The structural and optical properties of gc-Si:H films prepared by plasma enhanced chemical vapor deposition are studied with Raman spectra, scanning electron microscope, and ellipsometer measurements. The influence of grain size and defects on the opto-electronic characteristics of the photo-conducting dipole antenna is discussed. A sample of the antenna fabricated in our clean room laboratory is reported.
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