Abstract
Thin films of Ti–Ni–Pd and Ti–Ni–Pt shape memory alloys were produced by a DCmagnetron sputtering process. Targets with the following compositions were studied:Ti54Ni16Pd30,Ti54Ni6Pd40,Ti54Ni3Pd43 andTi54Ni26Pt20. The films weredeposited on SiO2/Si substrates at ambient temperature and were crystallized in situ at550 °C for 1 h. X-ray diffraction data show that the crystal structure of the martensitic phase isorthorhombic (B19) for all films and texturing is present in the Ti–Ni–Pt films.TEM micrographs show that both Ti–Ni–Pd and Ti–Ni–Pt films have a welldefined twin structure at ambient temperature. Transformation temperatureswere determined by both DSC and wafer curvature methods. The results indicatethat as the Pd content increases to 43 at.% the transformation temperatureAf, austenite finish temperature, increases up to516 °C. For the Ti–Ni–Pt film, at 20 at.% Pt, the austenite finish temperature is422 °C comparedto 273 °C for Ti–Ni–Pd at 30 at.% Pd. Experimental data also demonstrate that all the filmsfabricated exhibit the classic shape memory effect.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.