Abstract
Organic polymer thin films have been deposited on Si(100) and aluminum coated glass substrates by a dielectric barrier discharge (DBD) operated at medium pressure using different C2H m /N2 (m = 2, 4, 6) gas mixtures. The deposited films were characterized by various spectroscopic techniques. Fourier transform infrared reflection absorption spectroscopy (FT-IRRAS) revealed the chemical functional groups present in the films. The surface chemical compositions have been derived from X-ray photo electron spectroscopy (XPS). FT-IRRAS and XPS show the presence of sp, s p 2 and s p 3 bonds of carbon and nitrogen. Various functional groups such as NH containing, saturated and unsaturated alkyl groups have been identified. Thin films obtained from C2H2/N2 and C2H4/N2 gas mixtures revealed a higher N/C ratio when compared to thin films obtained from C2H6/N2. Thickness, refractive index and extinction coefficient were evaluated by spectroscopic ellipsometry (SE). Significant differences between the films obtained with different gas mixtures are observed.
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