Deposition and Characterisation of Nitrogen-Doped Zinc Oxide Thin Films by MOCVD Using Zinc Acetate—Ammonium Acetate Precursor

U S Mbamara,E.I Obiajunwa,O.O Akinwumi,I.A.O Ojo,E.O.B Ajayi

doi:10.4236/jmp.2012.38089

Abstract

The synthesis and comprehensive analysis of nitrogen-doped zinc oxide thin films grown from a compound precursor of zinc acetate and ammonium acetate has been reported. The precursor was processed in different ratios of the zinc acetate-ammonium acetate additives, and each combination was used to deposit a thin film using metalorganic chemical vapour deposition (MOCVD) method. The produced thin films were characterised using Rutherford backscattering (RBS) spectroscopy, uv-visible spectrometry, x-ray diffractometry, four point probe measurements and optical microscopy. The deposited thin films showed a fairly consistent zinc:oxygen:nitrogen ratio of 4.4:3.7:1, the film structures were quasicrystalline and the sheet resistivities were high, while other familiar characteristics like optical transmittance, bandgap, thermal stability, etc. were maintained in the grown films. Applications in device fabrication and active sensor devices were hence envisaged as the emergent potentials of the thin films.

Highlights

The synthesis and comprehensive analysis of nitrogen-doped zinc oxide thin films grown from a compound precursor of zinc acetate and ammonium acetate has been reported
The precursor was processed in different ratios of the zinc acetate-ammonium acetate additives, and each combination was used to deposit a thin film using metalorganic chemical vapour deposition (MOCVD) method
Applications in device fabrication and active sensor devices were envisaged as the emergent potentials of the thin films

Summary

Introduction

Zinc oxide thin films have in the present time assumed a formidable focus and an utmost importance in technological applications. The material and process of fabrication will determine the reproducibility and price of the end-product. In this wise it has been found that most of the sophisticated methods of production end up at research level, while the very simple methods are largely unreplicable or do not meet the requirements for device fabrication. Dopability is another vital consideration in the choice of process and raw material [7,9]. The thin films, which were deposited on glass substrate, were characterised and their properties were established

Experimental Details

Results and Discussion

Conclusions