Abstract
Titanium nitride (TiN) thin films were deposited on austenitic AISI 316L stainless steel substrate using magnetron sputtering method. The influence of process parameters of the magnetron sputtered on the thickness of the deposited layer and the corrosion resistance were investigated using factorial experimental design. The parameters studied included deposition rate and deposition time. The layer thickness was characterized by scanning electron microscopy (SEM). The corrosion behaviour was evaluated by potentiodynamic polarization and electrochemical impedance spectroscopy (EIS). The results indicated that the deposition rate and deposition time have an influence both on the deposited layer and in the corrosion resistance.
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