Dependency of threshold switching on density of localized states of Ge2Sb2Te5 thin films for phase change random access memory

Abstract

The threshold switching of Ge2Sb2Te5 (GST) films for phase change random access memory applications was investigated by measuring the variation in the threshold voltage (VT) with the crystallinity of the GST films and photon energy absorption spectra. As the GST film was amorphized, VT increased to approximately 1 V and its electrical resistance increased. The optical band gap and Urbach edge of the GST increased from 0.66 to 0.97 eV and from 12 to 65 meV, respectively, upon its amorphization. It was experimentally confirmed that the threshold switching is associated with the density of localized states of the GST.