Abstract
Micro-tensile properties of Au thin films with different grain sizes were measured using micro-tensile tests and the effect of grain sizes of the films on the properties was investigated. The micro-tensile specimens 2mm long and 100μm wide were fabricated by electromachining process using the films, deposited on the silicon by sputtering technique, with six different thicknesses ranging from 0.18 to 1.0μm. TEM observations showed the films with the respective different thickness had different grain sizes. As grain size increased, the yield strength decreased and followed the Hall-Petch relation. Furthermore, the yield strength also decreased with increasing the film thickness. Elastic modulus for the gold films was not affected with increase of the film thickness, but the value of the modulus for the film 0.18μm was higher than the values for the thicker film. Tensile strength also showed the dependency of the film thickness.
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