Abstract
Some general issues common to all reactors for gas-phase epitaxy of A3B5 metal-organic compounds include large temperature gradients in the reactor, leading to the formation of convection loops, high gas flow rates that can result in turbulence instead of the expected laminar flow, and the need for good uniformity and precision in temperature control of the semiconductor substrate surface. Since the deposition process for many complex semiconductor devices (such as infrared laser diodes or heterojunction bipolar transistors) is highly temperature-dependent, a system for precise temperature control of the process at the substrate surface directly in the deposition zone is necessary to obtain high-quality heterostructures with reproducible parameters.
 This article describes the features of the epitaxial growth process in MOCVD reactors, as well as highlights the tasks facing the temperature control system. The feasibility of using a radiation compensation system is explored in comparison to measurement methods using a thermocouple and classical pyrometry. Transformation of the input optical signal into a proportional output current in this system is performed by a sensitive photodetector, namely a silicon photodiode. The selection of the wavelength range of the radiation is determined by the optical parameters of the semiconductor substrates and compounds used in the system. The measurement spectrum is determined by the parameters of the interference filter in the system.
 The research was conducted to determine the effect of the interference filter width on the accuracy of determining the real temperature of a pyrometric control system with radiation compensation. The dependence of the interference filter characteristic width and shape on the correction value of the temperature of pyrometric systems after calibration is analyzed. Based on the results obtained, recommendations are made for selecting the optimal working wavelength and interference filter bandwidth of the optical system as a compromise between the determination error and the magnitude of the optical signal. The results can be used for the design of modern precision pyrometric systems.
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More From: Bulletin of Kyiv Polytechnic Institute. Series Instrument Making
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