Abstract
We have investigated the magnetic anisotropy and permeability of FeAlO films with Bs∼1.8 T and ρ∼1 µΩm. The films were prepared using a carousel-type sputtering system. Although an aligning magnetic field to induce uniaxial magnetic anisotropy was not applied to the substrates during deposition, the FeAlO films in the as-deposited state had uniaxial magnetic anisotropy. The anisotropy strongly depends on sputtering pressure. The direction of the magnetic anisotropy shifts 90° from the rotation direction to the radial direction of the substrate holder as the sputtering pressure increases. In the pressure range of 0.3–0.4 Pa, the measured µ–f properties are largely different from the theoretical one because of magnetic anisotropy dispersion. The anisotropy dispersion can be explained by a model with two orthogonal anisotropy components.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
