Abstract
The superparamagnetic thin films with a granular structure show a characteristic magnetization curve. In this study, Co-Al2O3 granular thin films were fabricated by the sputtering method with normal DC source for Co deposition, RF source for Al2O3 deposition, and pulsed DC reactive sputtering were used for fabrication of non-magnetic matrix of oxide or nitride of Al or Si. As a result, Co-Al2O3 superparamagnetic thin films with high magnetization could be obtained with high deposition rate. Very high deposition rate was obtained for fabrication of oxide or nitride films of Al or Si using the pulsed DC reactive sputtering method. This deposition rate was 5 times larger than RF sputtering method. It is expected that a sputtering method with DC source for Co deposition and pulsed DC source for matrix deposition will be effective to realize very high magnetization in the superparamagnetic granular thin films.
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