Abstract
In chemically amplified resists for ionizing radiation such as an electron beam, protons of acids come from not acid generators but base polymers. This means that the modification of base polymers has a great effect on the acid generation efficiency. The relation between relative acid yield and protecting groups of poly(4-hydroxystyrene) was examined. The selection of protecting groups is important for the acid generation efficiency and the acid distribution uniformity.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
More From: Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.