Abstract
We use sol–gel-processed SnO2 to fabricate thin-film transistors (TFTs) with good ambient stability, showing that SnO2 film densification can be effectively controlled by a choice of proper drying temperatures. In particular, TFTs comprising SnO2 films dried at 150 °C show conventional n-type semiconductor properties, high-saturation-regime field-effect mobility (7.3 cm2/Vs), good on/off current ratio, excellent sub-threshold swing values, and good electrical stability after 30-day exposure to ambient air, which alleviates the need for additional passivation layers to protect the active channel layer. Conversely, TFTs comprising SnO2 films dried at 50 or 100 °C show poor environmental stability due to low densification. Specifically, less dense films are characterized by the presence of loosely packed structures and small contact areas between crystallites, which promote the adsorption of gas molecules from the surroundings and result in significant TFT performance deterioration.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
