Demonstrative setup of EUVL source from three plasmas to be coupled in capillary discharge

Abstract

Extreme ultraviolet (EUV) source with short wavelength of 13.5nm sets a solid foundation for extreme ultraviolet lithography (EUVL) that will provide distinguishable limited line width of 30nm below and enough depth of focus in lithographic process. On the basis of a new scheme of EUV source from three plasmas to be coupled in capillary discharge, the demonstrative setup of three plasmas EUVL source in capillary discharge has been built and tested. By experiment, it is found that the single plasma source just emits very little power of radiation, while three independent plasmas source outputs intense radiation when three anode electrodes are concurrently discharged to the corresponding cathode electrodes. However, it is impossible for three independent plasmas to be coupled in capillary tube without the effect of the additional laser-produced plasma (LPP). As for the next work such as the weak positional coupling, the input of the laser beam and the delay time between the concurrent discharge and the ignition of the laser, it is worthy of doing.