Abstract
We present the first vacuum electronic traveling wave amplifier to incorporate an interaction circuit fabricated by ultraviolet (UV) photolithography and electroforming, demonstrating over 60 W of output power at 214.5 GHz from a 12.1 kV, 118 mA electron beam. The tube also achieved an instantaneous bandwidth of ${\sim}{\rm 15}~{\rm GHz}$ in $G$ -band in the small signal regime. The all-copper circuit was fabricated in two layers using a UV-transparent polymer monofilament embedded in the photoresist to form the beam tunnel prior to electroforming. Effects arising from fabrication errors and target tolerances are discussed. This microfabrication technique and demonstration paves the way for a new era of vacuum electron devices that could extend into the 1–2 THz range with advances in high-current-density electron guns.
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