Abstract
AbstractAC and DC Hall effects measurements as a function of temperature (77-300K) and frequency ( 1Hz-100KHz) have been performed to characterize Implanted Silicon films. This technique enables the determination of the annihilation processes of defects In such layers as a function of temperature of isochronal anneallngs (300°C to 1100°C during 1 hour). The experimental results are discussed with respect to proper transport models based on short and long range disorder considerations in order to find out the features of defects and Inhomogeneities arising from implantation and their thermal annihilation after isochronal annealing.
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