Defect centers and optical absorption edge of degenerated semiconductor ZnO thin films grown by a reactive plasma deposition by means of piezoelectric photothermal spectroscopy

Abstract

Undoped and Ga-doped (3 wt %) n-type ZnO thin films were grown by a reactive plasma deposition method on glass substrates at 200 °C under an oxygen flow rate from 0 to 50 SCCM. In this paper, we report on the defect and band edge related signals in the optical absorption spectra for ZnO thin film by using a piezoelectric photothermal (PPT) spectroscopy, which is effective in observing a nonradiative transition process. The PPT peak around 2.5 eV was observed only for the undoped ZnO samples grown under a low oxygen flow rate. This signal is considered to be related to the oxygen vacancies, because it disappears with the increase of the oxygen flow rates. No corresponding peak was found for the Ga-doped samples. This result indicates that Ga doping inhibits the generation of the oxygen vacancies, and it agrees with that from the first-principle electronic band structure calculations. We have also carried out the theoretical calculation for the optical absorption edge of degenerated ZnO as a function of the carrier concentration. Burstein-Moss effect and band-gap-narrowing effect in ZnO should be considered in the case of high carrier concentration. Comparing the experimental results with the theoretical predictions, we found out that the proposed PPT edge energy coincides well with the Fermi level EF.