Abstract
Defect-assisted local field rearrangement during nanograting formation is demonstrated by simply writing a nanograting perpendicularly across another one. It is shown that pre-distributed nanogrooves and laser-induced defects have a great impact on local field arrangement. Depending on the writing parameters, the nanograting period could be significantly altered as a consequence of this local field rearrangement. Accordingly, precise control of the overlap between neighboring passes during a sequential scan is achieved and well-shaped large-area nanogratings can be produced.
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