Abstract

The effect of different surfactants on the removal efficiency of wiping surfaces contaminated with single walled carbon nanohorns (SWCNHs) was studied. To this end, sodium dodecylbenzenesulfonate (SDBS) and sodium dodecyl sulfate (SDS) surfactants were used, and their removal efficiencies with water only and with cleaning with a dry wipe were compared. The surfactant concentrations and wipe pressure during the wiping process were varied, and significant effects on removal efficiency were found. In addition, the results were compared with those obtained with single-walled carbon nanotubes (SWCNTs) and multi-walled CNTs (MWCNTs) and the differences among these nanostructures were reported. The results suggest that SDS and SDBS are good candidates for removal of SWCNHs deposited on silicon wafers with SDS removal efficiencies capable of exceeding 90%. In addition, the results show that there is an optimum wiping pressure and surfactant concentration with the highest removal efficiency. A direct relationship was also found between wipe saturation and removal efficiency of SWCNHs deposited on silicon substrates. The differences between individual nano structures were perceptible in spite of following similar broad trends; for instance, SWCNH contaminated surfaces in general proved more difficult to clean than surfaces contaminated with the other nanostructures.

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