Abstract
Decomposition of tertiarybutylphosphine (TBP) on a clean Si(001) surface has been studied by thermal desorption spectroscopy (TDS), Auger electron spectroscopy (AES), and X-ray photoelectron spectroscopy (XPS). XPS results indicate that TBP adsorbs molecularly on the surface at RT. We find that TBP starts to decompose at about 100°C and this temperature is lower by about 300°C than in the gas phase. It decomposes to evolve 2-methyl-propyl radicals, 2-methyl-propylene, and hydrogen, leaving phosphorus on the surface. The AES result shows that no carbon species remain on the surface above 600°C.
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