Abstract
DC plasma jet CVD is applied to synthesize coatings from liquid state single source precursors on metallic substrates. For SiBCN coating synthesis hexamethylcyclotrisilazanoboranes with Si/B ratio 3:1, 3:2 and 3:3 are used. SiCNTi coatings are produced with tris(dimethylamino)- and tris(diethylamino)hexamethylcyclotrisilazanotitanium. Attempts to deposit SiCNZr coatings by use of tris(diethylamino)hexamethylcyclotrisilazanozironium are not successful due to too high precursor viscosity. Vacuum plasma sprayed nickel, molybdenum and copper interlayers prove to permit effective suppression of nitride and boride reaction zone formation, which is observed during direct SiBCN coating deposition on mild steel substrates. By use of adapted process parameters coatings with columnar or dense morphology and amorphous or nanocrystalline structure can be synthesized. Deposition rates exceeding 2000 μm/h are achieved. By relative movement between DC plasma torch and substrate surface the coated area is enlarged. Simultaneous improvement of coating density and homogeneity is observed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
