Dc-Hydrogen plasma induced defects in bulk n-Ge

Abstract

Bulk antimony doped germanium (n-Ge) has been exposed to a dc–hydrogen plasma. Capacitance–voltage depth profiles revealed extensive near surface passivation of the shallow donors as evidenced by ∼a 1.5 orders of magnitude reduction in the free carrier concentration up to depth of ∼3.2μm. DLTS and Laplace-DLTS revealed a prominent electron trap 0.30eV below the conduction (EC–0.30eV). The concentration of this trap increased with plasma exposure time. The depth profile for this defect suggested a uniform distribution up to 1.2μm. Annealing studies show that this trap, attributed to a hydrogen-related complex, is stable up to 200°C. Hole traps, or vacancy-antimony centers, common in this material after high energy particle irradiation, were not observed after plasma exposure, an indication that this process does not create Frenkel (V–I) pairs.