Abstract
Department of Advanced Materials Science and Engineering, Mokpo National University, Jeonnam, 534-729, Korea(Received August 1, 2014 ; revised August 20, 2014 ; accepted August 25, 2014)ABSTRACTThe paper presents the comparative results of TiAlN coatings deposited by DC and pulsed DC asymmetricbipolar magnetron sputtering systems. The results show that, with the decreasing duty cycle and increasingpulse frequency, the coating morphology changes from a columnar to a dense structure, with finer grains.Pulsed sputtered TiAlN coatings showed higher hardness, higher residual stress, and smaller grain sizes thandc prepared TiAlN coatings. Moreover residual stress of pulsed sputtered TiAlN coatings increased on increas-ing pulse frequency. Meanwhile, the surface roughness decreased continuously with increasing pulsed DCfrequency up to 50 kHz.
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