Abstract
In device technology, the multilayer contacts provide improved performance. The comparative study of different high work function bilayer Schottky metal (Pt/Pd, Pt/Ni and Pt/Ti) contact has been taken to study the DC and RF performance of n -GaN Schottky diode. The fabricated Schottky metal contact Pt/Pd, Pt/Ni and Pt/Ti annealed from room temperature to 800 °C studied shows that Pt/Pd Schottky metal contact on n -GaN shows high thermal stability and maximum barrier height 1.10 eV, ideality factor 1.001, lower series resistance and lower insertion loss (S 21 dB) at high frequency compared to Pt/Ni and Pt/Ti bilayer Schottky metal contact.
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