Data preparation and fabrication of DOE using electron-beam lithography

Abstract

The application of electron-beam lithography to the generation of diffractive optical elements topology is examined. The formula for the estimation of exposure data volume for variable-shaped electron-beam lithography is presented as a function of diffractive optical element parameters and approximation accuracy. A special software dedicated to preparing exposure data for fabrication of diffractive optical elements is developed. Diffractive optical elements with an artificial refractive index are manufactured with a feature size much less than the wavelength. Design and experimental results on photomasks fabrication for an optical element focusing radiation into a ring with pregiven parameters are presented. The photomask set is manufactured for a reflecting optical element focusing the high power CO 2 laser beam into two points with required parameters for laser welding.