Abstract
Dynamic microscale strain distributions with temporal resolution of 1 s in a smooth and a cracked Ti-6Al-4V alloys during one-cycle dwell fatigue tests are illustrated in videos (URL: https://drive.google.com/drive/folders/1pit_VV2apGOpETVfaJAAtL5Xl2CNOiJ3?usp=sharing). The tensile strain distributions were measured by the video sampling moiré method from the 1-μm-pitch grid images in a scanning electron microscope. The strain concentration factors of the smooth and the cracked specimens are 1.96 and 2.65, respectively. The plastic strain increment is 0.0007 during the displacement holding time of 591s in the smoothed specimen at maximum stress of 900 MPa., and 0.0008 during the displacement holding time of 593s in the cracked specimen at maximum stress of 870 MPa. The typical strain results are analyzed in 1-s-resolved strain mapping in Ti-6Al-4V alloys during dwell fatigue in SEM by video sampling moiré [1].
Highlights
Dynamic microscale strain distributions with temporal resolution of 1 s in a smooth and a cracked Ti-6Al-4V alloys during one-cycle dwell fatigue tests are illustrated in videos (URL: https://drive.google.com/drive/folders/1pit_VV2apGOpETVfaJAAtL5Xl2CNOiJ3?usp1⁄4sharing)
The tensile strain distributions were measured by the video sampling moire method from the 1
The typical strain results are analyzed in 1-s-resolved strain mapping in Ti-6Al-4V alloys during dwell fatigue in Scanning Electron Microscope (SEM) by video sampling moire [1]
Summary
The specimen material was Ti-6Al-4V bimodal titanium alloy [2]. A smooth specimen and a cracked specimen were prepared by mechanical polishing. 1-mm-pitch grids were fassbricated on both specimens by electron beam lithography. 1-mm-pitch grids were fassbricated on both specimens by electron beam lithography. The electron beam resist (EBR-9, Toray) was spin-coated on either specimen at 2000 rpm for 60s, baked at 195 C for 30 min [3], and exposed with electron beam in a scanning electron microscope (SEM, Quanta 200 FEG) combined with a patten generator Locations of analyzed areas in Ti-6Al-4V alloy specimens and 1-mm-pitch grid images. The resist was developed in a Type 1 solution for 60 s and rinsed in a 2-propanol solution for 30 s to generate a grid pattern on either specimen. To ensure SEM observation without the trouble caused by electrostatic discharge, the resist grid pattern was covered by a very thin gold layer using an ion coater (IB-5, EIKO Engineering)
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