Abstract
The properties of titanium oxide thin films deposited by d.c. magnetron reactive sputtering are strongly dependent on the sputtering conditions. The aim of the present work is to investigate the discharge parameters such as target voltage, deposition rate and intensity of the ionic species present in the plasma as a function of time and oxygen partial pressure.The discharge deals with a titanium cathode. Ar–O2 gas mixtures are used. Their composition goes from pure argon to pure oxygen. The total pressure varied from 5 to 20 mTorr and the discharge current from 200 to 500 mA.In an attempt to understand the origin of these effects, we use a theoretical model, in which the plasma–surface interactions and the role of reactive plasma species are taken into account. The model allows us to explain the origin of the experimental results.
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