Abstract

Diamond layers with different amounts of boron and nitrogen were deposited on silicon substrates in a hot-filament CVD reactor. These layers are characterized by the simultaneous deposition of diamond and graphite. Electrochemical properties were measured in acid and basic solutions to gain knowledge about their potential application as electrodes for industrial wastewater treatment or for other fields of electrochemistry. While boron-doped layers show potential windows up to 4.3 V at 10 mA cm −2 in 0.1 N H 2SO 4 and 3.8 V at 50 mA cm −2 in 6 N NaOH, the size of the potential windows of mixed diamond–graphite layers decreases to 3 V in H 2SO 4 and 3.1 V in NaOH. During the electrochemical measurements, oxidation of graphite could be observed.

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.