Abstract
This work introduces the fabrication of nano scale magnetostrictive NiFe2O4 (NFO) thin films using reduced pressure metallorganic chemical vapor deposition (MOCVD) with programmable cyclic pulsing of novel precursor combination — n-butylferrocene and nickelocene. Using a custom-designed CVD system, different rate-limiting steps and Ea in the CVD of iron oxide and nickel oxide depositions are discussed. Both cyclic-deposition and co-deposition modes were investigated through NFO depositions on silicon substrates at 17 Torr and 500°C. Growth rates of NFO films obtained by co-deposition and cyclic-deposition were 3 and 1.6 nm/min, respectively. Material characterizations were conducted on NFO films fabricated at optimized process conditions and annealed samples. Rutherford backscattering spectroscopic results showed better stoichiometric control for cyclic-deposited films. As-deposited NFO films showed homogeneous stoichiometric chemical composition without carbon contamination in the bulk film; a saturation magnetization of 25 emu/g was observed from its trevorite crystalline phase upon annealing at 700°C in argon ambience for one hour.
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