CW operation at - 10°C for InGaAlP visible light laser diodes grown by MOCVD

Abstract

CW operation at - 10°C for InGaP/InGaAlP double heterostructure (DH) laser diodes has been achieved for the first time. The DH wafers were grown by low-pressure metalorganic chemical vapour deposition using methyl metalorganics as the source of group III elements. Under room-temperature pulsed operation, the lasing wavelength was 663 nm and the lowest threshold current density was 7.8 kA/cm2. The CW characteristic temperature T0 was 63 K at around -30°C.