Abstract
AbstractLocal and controllable growth of nanocrystalline silicon (nano‐Si) in a commercial borosilicate glass is demonstrated. The nano‐Si was formed in the subsurface region of the glass via aluminothermic reaction in the course of the irradiation of a 2D array of aluminum nanodisks fabricated on the glass surface with CW low‐power 633 and 532 nm lasers. The thermoplasmonic nature of the nanodisks heating is demonstrated: at low incident intensity, the phenomenon takes place only if the plasmon resonance of the array and the laser wavelength is close enough. However, when the laser beam intensity at the sample surface exceeds 8 MW/cm2 mutual position of the plasmon resonance and the laser wavelength weakly influences the phenomenon. The nano‐Si formation is studied with Raman scattering technique, and the average size of the silicon nanocrystals is evaluated.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
