Curve fabrication model analysis of near-field photolithography

Abstract

The Levenberg–Marquardt method is used to interpolate within the allowable maximum confined chord error through reasonable convergence criteria, to ensure that the geometric error of the designed and fabricated curves of near-field photolithography, constructed and planned with micro-lines segments, lie within an acceptable range. Meanwhile, the exposure energy density of the interpolated point during the fibre probe scan turning is integrated and added when processing two micro-lines, to create a method for analysing the exposure energy density of curve fabrication. Finally, the simulation in this paper shows that, during photolithographic curve fabrication, the contours of exposure energy density of the convex curvature of similar curves made by various micro-lines tend to face the fabrication central line. Therefore, the fabrication line tends to move towards concave curvature, and diffuses towards concave curvature. The depth of the simulated fabrication curve increases, whereas the full-width at half maximum (FWHM) decreases.