Abstract
In this work, a current-to-transconductance ratio technique is proposed for simultaneous extraction of the threshold voltage (VT) and parasitic source (RS) and drain (RD) resistances in short channel metal–oxide–semiconductor field-effect transistors (MOSFETs). The proposed technique allows simultaneous extraction of RS, RD, and VT in any single MOSFET with the channel length modulation (CLM) and the structural asymmetry. The proposed method is experimentally verified through Si MOSFETs with intentional asymmetry by connecting an external resistor (Rext) to the source terminal. We experimentally confirmed that extracted RS, RD, and VT are independent of the drain bias (VDS) and intentional Rext employed for the asymmetry. We also compared the results with previously reported techniques.
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