Abstract

An In0.5Ga0.5P/GaAs0.93Sb0.07/GaAs heterostructure is grown by metal-organic chemical vapor deposition and demonstrated to be an alternative to InGaP/GaAs systems for use in single heterojunction bipolar transistors (SHBTs). The In0.5Ga0.5P/GaAs0.93Sb0.07/GaAs double heterojunction bipolar transistor (DHBT) device structures are identical to the control SHBTs except for the incorporation of antimony to the base layer. The InGaP/GaAsSb/GaAs DHBT has a lower turn-on voltage than the control InGaP/GaAs SHBT. Details of the effect of the base current on the offset voltage in the studied devices are explored. The dc current gain β of the InGaP/GaAsSb/GaAs DHBT is virtually independent of collector current at 300 K. The current gain of the GaAsSb-based DHBT is greater than 40 at a very small collector current of 1 μA at 300 K. The dependence of the current gain on temperature at various collector currents is discussed. The variation of β with temperature is slight at high currents over the range of 300 K-390 K. Furthermore, the current gain of the InGaP/GaAsSb/GaAs DHBT exhibits almost no dependence on the collector-base voltage VCB, demonstrating the nonblocking “type-II” band lineup at the base/collector heterojunction.

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