Abstract
Infrared focal plane arrays are a critical component in many of the military and civilian applications for advanced imaging systems. Advanced material growth and etching techniques have made possible the fabrication of infrared detectors in various configurations and in a broad range of wavelengths for a variety of applications. In the last decade, many researchers have explored advances in the processing and growth techniques, which have made it possible to realize complex detector concepts, array architectures and improvements in the producibility of these devices. In this paper, infrared detector materials and structures will be reviewed with emphasis on applicability to designs of focal plane arrays for single and multi-wavebands. Key developments and status of the technology will be presented along with projections and challenges for the continued evolution of the technology.
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