Abstract
AbstractHerein, the assembly of CsPbBr3 QD/AlOx inorganic nanocomposites, by using atomic layer deposition (ALD) for the growth of the amorphous alumina matrix (AlOx), is described as a novel protection scheme for such QDs. The nucleation and growth of AlOx on the QD surface was thoroughly investigated by miscellaneous techniques, which highlighted the importance of the interaction between the ALD precursors and the QD surface to uniformly coat the QDs while preserving the optoelectronic properties. These nanocomposites show exceptional stability towards exposure to air (for at least 45 days), irradiation under simulated solar spectrum conditions (for at least 8 h), and heat (up to 200 °C in air), and finally upon immersion in water. This method was extended to the assembly of CsPbBrxI3−x QD/AlOx and CsPbI3 QD/AlOx nanocomposites, which were more stable than the pristine QD films.
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