Abstract
The structural properties of a potassium lithium niobate (KLN; K 3Li 2Nb 5O 15) thin film deposited by rf-magnetron sputtering on a Pt/Ti/SiO 2/Si(100) substrate were investigated. The crystalline structures of the Pt under layer and KLN thin films were examined using θ–2 θ, θ-rocking, and mesh scan X-ray diffraction (XRD). The XRD results revealed that the Pt under layer was a strong (111) direction orientated poly crystal. Unlike the Pt under layer film, the KLN(001) peak was found to consist of two separate peaks, one with a broad full width half maximum (FWHM) and the other with a narrow FWHM, indicating that the KLN film had a single crystalline structure. The surface and cross-section morphology were investigated using a scanning electron microscope (SEM). Accordingly, from the results of the SEM and XRD experiments, it was concluded that the KLN film was composed of small single crystals, which had a four-fold symmetry morphology with a c-axis normal to the substrate.
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