Abstract
The effect of crystallographic orientation on radiation damage in Ga-ion irradiated Ni-based polycrystalline alloy processed by a focused ion beam was investigated using advanced analytical transmission electron microscopy. After irradiation, the radiation-induced defects exhibited different morphologies on the surfaces of {0 0 1}, {0 1 2} and {1 1 4} grains of the Ni-based alloy. Moreover, the {0 0 1} grain was found to have thicker remaining material than the {0 1 2} and {1 1 4} grains, indicating that the {0 0 1} grain had a larger sputter yield than the other two grains during irradiation. The physical nature of the crystallographic orientation dependence of the defect morphology and sputter yield was investigated and discussed.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
