Abstract
Crystallization behavior of an amorphous silicon nitride powder produced in an RF thermal plasma by the vapor-phase reaction of silicon tetrachloride and ammonia has been investigated. Effects of annealing conditions such as temperature and duration of heat treatment on the properties of powders were studied. Changes in the chemical and phase compositions, as well as in the morphology of powders were measured and interpreted. Annealing of the amorphous silicon nitride powder at 1450°C for 120 min resulted in a powder of about 80% crystalline phase content with an α/β ratio of about 6.5. ©
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