Abstract
Transmission electron microscopy and electron diffraction data are reported for crystalline metastable phases obtained by vacuum annealing amorphous sputtered 55wt.%Cr-45wt.%Ni thin films on their substrates for 3 h at temperatures ranging from 170 to 370°C. These data are compared with data for the metastable phases observed in as-deposited Cr-Ni thin films prepared by vacuum evaporation or by sputtering.
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