Abstract
Transmission electron microscopy is used to determine the grain size distribution and examine planar defect structures in nanocrystalline TiO 2 and SnO 2 films deposited by r.f. sputtering. The observed defects consist mainly of fine twin lamellae and crystallographic shear planes with a (011) habit plane. These results are discussed in relation to those of previous investigations of stoichiometric and non-stoichiometric thin films and nanocrystalline powders prepared by the inert gas condensation technique. The influence of departures from stoichiometry on the formation of CSP and their role as sinks for point defects (oxygen vacancies) is considered.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
