Abstract
TiO2 films were deposited by r.f. reactive magnetron sputtering on nonalkali glass without substrate heating using a 3-inch-φ magnetron cathode with various magnetic field strengths (MFS, 150–1000 G) and shapes (balanced or unbalanced) at a total gas pressure of 1.0 or 3.0 Pa. The crystallinity and photocatalytic activity of TiO2 films showed a clear tendency to decrease with the decrease in MFS during the deposition. Decrease in plasma impedance by increasing the MFS was confirmed to be effective in the deposition of high-performance photocatalytic TiO2 films by magnetron sputtering.
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