Crystalline Structure and Surface Morphology of the AlN films sputtered on 64°-YX LiNbO&lt;inf&gt;3&lt;/inf&gt;

Feng-Chih Chang,Sean Wu,Maw-Shung Lee,Jian-Shuo Yu,Chia-Hsiung Chang,Cheng-Liang Huang

doi:10.1109/isaf.2007.4393196

Crystalline Structure and Surface Morphology of the AlN films sputtered on 64°-YX LiNbO<inf>3</inf>

Feng-Chih Chang, Sean Wu + Show 4 more

https://doi.org/10.1109/isaf.2007.4393196

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Publication Date: May 1, 2007

Citations: 1

Affiliation: National Cheng Kung University, Tung Fang Design Institute, National Kaohsiung University of Applied Sciences

#Crystalline Structure Of Films #Aluminum Nitride Films + Show 8 more

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Abstract

Highly (002) oriented aluminum nitride (AlN) films were successfully prepared on a 64deg-YX LiNbO3 substrate by r.f. magnetron sputtering. The crystalline structure of the films was determined by grazing incident angle X-ray diffraction (XRD) and the surface microstructure of films was investigated by Scanning electron microscope (SEM). The atom composition ratio (Al/N) of the films was also determined by Energy Dispersive X-ray Spectroscopy (EDS). The results showed the optimal (002) oriented AlN films were prepared at 200 C and 5 m Torr. The atom composition ratio (Al/N) was 0.96 (near 1).

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