Abstract
The present study reports the cross-sectional transmission electron microscopicinvestigations of swift heavy ion-irradiation induced nano-size recrystallization of Ni in anearly immiscible W/Ni multilayer structure. Multilayer structures (MLS) of[W(25 Å)/Ni(25 Å)]10BL weregrown on Si-(100) substrate by the ion-beam sputtering technique. The as-synthesized MLS were subjected to120 MeV-Au9+ ion-irradiationto a fluence of ∼5 × 1013 ions cm−2. Wide-angle x-ray diffraction studies of pristine as well as irradiated W/Ni multilayersshow deterioration of the superlattice structure, whereas x-ray reflectivity (XRR)measurement reveals a nearly unaffected microstructure after irradiation. Analysis of theXRR data using ‘Parratt’s formalism’ does show a significant increase of W/Ni interfaceroughness. Cross-sectional transmission electron microscopy (TEM) studies carried out indiffraction and imaging modes (including bright-field and dark-field imaging),show that at high irradiation dose the intralayer microstructure of Ni becomesnano-crystalline (1–2 nm). During these irradiation induced changes of the intralayermicrostructure, the interlayer definition of the W and Ni layers still remains intact.The observed nano-recrystallization of Ni has been attributed to competitionbetween low miscibility of the W/Ni interface and the ion-beam induced mixingkinetics.
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