Abstract
The preparation of TEM cross-section samples from multilayer films or poorly adhering films is discussed in detail in a step-by-step approach designed to enable a competent experimentalist to reproduce the technique. The samples are mounted on an aperture grid and mechanically polished to 2-3 microns in thickness. After ion beam milling for a short period of time (less than 1 hour), a large electron transparent area is obtained. Examples from several thin film systems are discussed.
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