Abstract
Cr-N films were deposited using a dc reactive sputtering apparatus equipped with an optical emission spectroscope(OES) and the behavior of some species excited in the plasma was monitored by OES during sputtering. The films deposited were characterized with respect to the chemical composition, crystal structure and wear resistance. The results are summarized as follows.(1) The N/Cr ratio monitored by OES increased proportionally with the nitrogen partial pressure.(2) The N/Cr ratio in the deposited films was nearly proportional to the N/Cr ratio measured by OES during sputtering. Therefore, it may be possible to control the chemical composition of Cr-N films during sputtering.(3) The N/Cr ratio in the Cr-N films increased continuously , and the structure of the films changed from Cr2N through Cr2N+CrN to CrN with increasing nitrogen partial pressure.(4) Cr2O3 oxide surface layer was observed on the Cr-N films after heating at 800°C for 60 min in air.(5) The crystal structure of CrN films hardly affected the friction coefficient at room temperature. The wear resistance of CrN single-phase film was superior to Cr2N single-phase film and Cr2N+CrN dual-phase film at 100°C.
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